Titanium sputtering target is a titanium product made of metallic titanium, used for sputtering coating to produce titanium thin film. Simply put, there are two methods for making titanium sputtering targets with metallic titanium. 1. Casting melts the raw materials with a certain distribution ratio, pours the alloy solution into the mold to form an ingot, and finally processes it into a sputtering target. The method is smelted and cast in vacuum; 2. Powder metallurgy: melting raw materials with a certain distribution ratio, casting into ingots and then pulverizing, isostatically pressing the powder, then sintering at high temperature, and finally forming a target.